Movable Lab Equipment Air Pollution Laminar Flow in Microbiology Clean Bench

• Customization: Available
• Capacity: Customizable
• After-sales Service Provided: Engineers available to service machinery overseas
• Model NO.: SZP
• Certification: CE, ISO9001
• Usage: Research Institute, Hospital, School, Cleanroom
• Noise: ≤62DB
• Type: Horizontal Flow Clean Bench
• Model No.: Szfm-Czl1800
• Air Cleanliness Level: ISO5 Level, 100 Level (Us Federal 209e)
• Illumination: >300lx
• Rated Power: 800W
• Adapt to The Number of People: Multiplayer One-Sided
• Bottom Configuration: 4 Foot Cups / 4 Universal Wheels
• Fan: 2 Sets of Centrifugal Fans
• Primary Filter: 2 Tablets
• Countertop Material: Made of SUS304# Stainless Steel
• Air Velocity: 0.45m/S
• Voltage: 220V/50Hz
• Clean Lamp Specification: 21W 2 Lamps.
• The Main Material: Made of High-Quality Cold Plate Baking Paint
• Control Panel: Button Type, with Light, with Gear Speed Regulati
• Table Configuration: Two Sets of Five-Hole Sockets
• Transport Package: Export Package
• Specification: customizable
• Trademark: Pharma
• Origin: China
• Production Capacity: 100 Sets/Month

Product Description

Clean Bench is a term used in the semiconductor industry to refer to a clean and uncontaminated work surface. It is essential in the manufacturing process of semiconductor devices, as even the slightest amount of contamination can have a significant impact on the final product's performance and reliability.

A clean bench typically consists of a solid surface, such as a benchtop or table, that is covered with a cleanroom-grade material, such as stainless steel or a high-purity polymer. The surface is then sealed and equipped with HEPA filters to remove particles and contaminants from the air.

To maintain a clean bench, it is essential to follow strict procedures to prevent contamination, such as wearing cleanroom clothing and following proper handling and storage protocols for materials and equipment. Regular cleaning and maintenance of the clean bench and its components are also critical to maintaining a clean and uncontaminated work environment.

In summary, a clean bench is a crucial element in the semiconductor manufacturing process, ensuring the production of high-quality and reliable semiconductor devices.
 

 

Model		HS840	HS1300
Applicable Station		one person one side	two persons one side
Airflow Direction		Vertical
Function	Cleanliness	Class 100
	Collection Efficiency	≥99.9% of 0.5um particle
	Colony Count	≤0.5/vessel (petri dish is φ90mm )
	Wind Speed	initial:0.6(m/s), final:0.2 (m/s)
	Wind Speed Range	0.2-0.6 (m/s)
	Noise Level	≤62db
	Vibration Semi-Peak Value	≤3um
	Illumination Intensity (Lx)	≥300LX(Activity Center)
	Work Surface Bearing	50kg
Composition	Inner Chamber	Stainless steel plate
	Outer Shell	Cold rolling steel electrostatic spraying exterior
	Operation door	No
	HEPA Filter(mm)	760*610*50 one piece	610*610*50 two pieces
	Pre-Filter (mm)	760*610*5 one piece	610*610*5 two pieces
	Fluorescent Lamp	20W*1	30W*1
	UV Lamp	20W*1	30W*1
	Bottom Fan	300W one piece	300W two pieces
Controller	Display	LED
	Wind Speed Control	Intelligent multi-level adjustable
	Additional Function	The bottom vertical adjustment, one key to open and close lighting sterilization
Specification	Inner Size (W*L*H)(mm)	660*650*570	1210*660*570
	Exterior Size(W*L*H)(mm)	840*825*1340	1300*810*1440
	Packing Size (W*L*H)(mm)	1040*1020*1620	1460*990*1570
	Max Power	0.4kW	0.8kW
	Current Rating(50/60Hz)	AC220V/1.8A	AC220V/3.6A
	NW/GW kg	120/170	170/235